C10200 vs C11000 Copper Selection Guide: Tsis txhob cia Cheap Materials Choices rhuav tshem koj cov khoom kawg

Sep 06, 2026

Tso lus

Kev Taw Qhia - Tib Xim, Tib Kev Coj Ua, Tab sis Ntiaj Teb Sib nrug

Ob tug tooj liab strips zaum ib sab ntawm lub workbench. Tib yam reddish-xim txiv kab ntxwv. Tib 100% IACS conductivity ntsuam xyuas. Ib tus nqi 30% ntau dua li lwm tus. Tus neeg saib xyuas kev yuav khoom xaiv qhov pheej yig dua. Rau lub hlis tom qab, tom qab lub tshuab nqus tsev brazing, cov khoom tawg qhib zoo li cov qhob cij overbaked - micro- tawg txhua qhov chaw, tag nrho cov khoom pov tseg. 30% kev txuag cia li dhau los ua 300% poob.

 

Qhov no yog tus nqi tiag tiag ntawm kev tsis nkag siab qhov txawv ntawmC10200 oxygen-dawb tooj liab (OFC)thiabC11000 electrolytic tawv pitch tooj liab (ETP) .

 

Ob leeg yog qib siab -purity tooj liab. Ob leeg ua tau raws li "ntshiab tooj liab" spec ntawm feem ntau cov duab kos. Tab sis qhov sib txawv me me hauv cov ntsiab lus oxygen - tsuas yog 0.03% - txiav txim siab seb koj cov khoom puas muaj sia nyob siab -kev ua haujlwm kub lossis ua tsis tau zoo.

 

Yog tias koj yog ib tus kws tshaj lij, tus kws tshaj lij kev yuav khoom, lossis cov chaw tsim khoom ua haujlwm nrog tooj liab strips, busbars, txhuas thav duab, lossis cov khoom siv nqus tsev vacuum, phau ntawv qhia no yuav pab koj xaiv cov khoom siv zoo - thiab zam kev ua yuam kev kim.

 

Tshuaj muaj pes tsawg leeg - Qhov txawv pib

 

Qhov sib txawv tseem ceeb ntawm C10200 thiab C11000 nyob hauv ib tus lej: cov ntsiab lus oxygen.

Parameter C10200 (Oxygen-Dawb tooj liab / OF) C11000 (ETP tooj liab / Tough Pitch)
Tooj liab Purity (Cu) Ntau dua lossis sib npaug li 99.95% Ntau dua lossis sib npaug li 99.90%
Cov ntsiab lus Oxygen Tsawg dua lossis sib npaug rau 0.001% ( Tsawg dua lossis sib npaug li 10 ppm) - zoo li xoom 0.02 - 0.05% (200 - 500 ppm)
JIS sib npaug C1020 C1100
ASTM Txuj ASTM B152 / B152M ASTM B152 / B152M
UNS npe C10200 C11000
Lub Npe OFC (Oxygen-Free Copper), OFHC ETP (Electrolytic Tough Pitch) tooj liab

 

Composition Difference Tiny Oxygen Gap Makes Huge Impacts

Lub Oxygen Ua li cas tiag?

Hauv C11000, cov pa oxygen tsis yog oxygen dawb. Nws tshwm sim raws li cuprous oxide (Cu₂O) cov khoom faib raws cov qoob loo ntawm cov tooj liab matrix. Cov khoom no pom nyob rau hauv lub tshuab microscope. Lawv txhob txwm tshaj tawm thaum lub sij hawm electrolytic refining vim lawv pab oxidize thiab tshem tawm lwm yam teeb meem impurities, txhim kho conductivity.

Nyob rau hauv C10200, tshwj xeeb refining txheej txheem (xws li lub tshuab nqus tsev melting los yog tswj- atmosphere casting) tshem tawm tag nrho cov pa oxygen, tawm hauv cov khoom uas yog 99.95% ntshiab tooj liab uas tsis muaj Cu₂O hais.

Qhov takeaway: C11000 muaj microscopic Cu₂O "bombs" tos rau cov xwm txheej zoo kom tawg. C10200 tsis.

Kev sib piv kev ua tau zoo: Kev coj ua tsis yog qhov sib txawv loj

 

Ib qho kev xav tsis zoo: cov kws tsim qauv xaiv C10200 rau kev ua tau zoo ntawm hluav taws xob lossis thermal ua haujlwm. Hauv kev muaj tiag, qhov sib txawv yog marginal rau feem ntau cov ntawv thov kev lag luam. Qhov kev txiav txim siab sib txawv yog qhov tsis kam tiv thaiv hydrogen embrittlement.

Yam khoom ua haujlwm C11000 (ETP tooj liab) C10200 (Oxygen-Free Copper)
Hluav taws xob conductivity ~ 100% IAB 101% -102% IAB
Thermal conductivity ~388‑390 W/(m·K) ~391‑398 W/(m·K)
Hydrogen-embrittlement Risk Siab heev Tiv thaiv kab mob
Tus nqi ntawm cov khoom siv txheeb ze Baseline siv 20% -50% tus nqi siab dua

Nco tseg: Qhov 1-2% qhov sib txawv ntawm cov conductivity tsis tshua hloov cov khoom tsim tawm. Them tus nqi loj tsuas yog rau kev coj ua zoo dua feem ntau yog kev lag luam kev lag luam tsis zoo.

 

Dab tsi yog Copper Hydrogen Embrittlement ("Hydrogen Disease")

Qhov no yog lub hauv paus tsis ua hauj lwm hom koj yuav tsum tau saib rau. Thaum C11000 yog cua sov siab tshaj 370℃nyob rau hauv kev txo qis / hydrogen-nplua nuj cua, hydrogen atoms nkag mus rau hauv tooj liab nplej thiab hnov ​​​​mob nrog rau hauv cuprous oxide:

Cu₂O + H₂ → 2Cu + H₂O (steam)

Chav vapor generates siab sab hauv uas tsis tuaj yeem khiav tawm sab nraud. Nws tsim micro-voids thiab inter-granular micro-cracks hauv cov khoom tooj liab. Cov txiaj ntsig pom muaj xws li:

Internal micro-cracks thiab zais npuas

30-50% poob rau hauv lub zog txhua yam

Vacuum-component cua to thiab sealing tsis ua hauj lwm

Ua npuas ncauj loj lossis ib feem puas thaum lub sijhawm tsim khoom loj

Txij li thaum C10200 muaj yuav luag xoom oxygen, qhov tshuaj tiv thaiv tsis tuaj yeem tshwm sim, yog li nws muaj peev xwm tiv taus cov kab mob hydrogen.

 

Cov xwm txheej ua haujlwm uas ua rau Hydrogen embrittlement

Txheej txheem / Scenario Qhov kub thiab txias C11000 Risk Level C10200 Kev pom zoo
Torch brazing nrog hydrogen-nplua nuj nplaim taws 600-850 degree Kev pheej hmoo siab Pom zoo heev
Lub tshuab nqus tsev vacuum brazing 800-1050 degree Kev pheej hmoo siab Yuav tsum siv
Hydrogen-atmosphere annealing 400-600 degree Kev pheej hmoo siab Yuav tsum siv
Kub tin-dipping / tinning 250-300 degree Kev pheej hmoo tsawg Xaiv tau
General TIG/MIG welding tooj liab melting point Kev pheej hmoo nruab nrab Txaus siab rau qhov yuav tsum tau nruj-sealing
Kev ua haujlwm ib puag ncig-kub (<150 degree) Chav kub Tsis muaj kev pheej hmoo C11000 yog txaus

 

Ntxiv qhov sib txawv: Machinability, Formability, thiab Vuam

 

Machinability - C11000 Muaj Ntug

Cu₂O particles nyob rau hauv C11000 ua raws li chip breakers thaum machining. Lawv tsim cov chips luv dua, tswj tau ntau dua thiab zoo dua nto tiav thaum tig, milling, thiab drilling. C10200 yog purer thiab softer, uas yuav ua rau gumminess, cuab tam sticking, thiab burr tsim thaum txhoj puab heev txiav.

 

Yog tias koj cov txheej txheem cuam tshuam nrog CNC machining ntau, C11000 tej zaum yuav yog qhov kev xaiv zoo dua - yog tias koj tsis xav tau siab - ua haujlwm kub.

 

Formability thiab dabtsi yog khoov - C10200 yog Superior

C10200's purity siab dua muab nws ductility zoo dua thiab ua haujlwm qis dua -cov nqi hardening. Rau nruj- vojvoog dabtsi yog khoov (R / t < 1.5), C10200 muaj kev pheej hmoo tsawg dua ntawm kev tawg vim tias tsis muaj Cu₂O particles los ua qhov chaw pib tawg.

 

C11000 tseem tuaj yeem khoov tau, tab sis ntawm lub voj voog nruj heev, Cu₂O cov khoom tuaj yeem ua cov ntsiab lus tawg.

 

Weldability - C10200 Yeej Hands Down

  • C11000: Lub Cu₂O nyob rau hauv lub pas dej weld tuaj yeem hnov ​​​​mob nrog hydrogen (los ntawm ya raws los yog cov pa tiv thaiv) los tsim cov roj porosity hauv qhov vuam. Qhov no compromises weld lub zog thiab hermeticity.
  • C10200: Ua kom ntom ntom, porosity-dawb welds nrog cov khoom siv zoo heev thiab lub tshuab nqus tsev- nruj seals.

Daim Ntawv Qhia: Thaum Xaiv C10200 vs C11000

 

Daim ntawv thov Scenario Kev pom zoo Yog vim li cas
General hluav taws xob busbars, hluav taws xob faib C11000 Tus nqi -kev ua tau zoo, kev ua haujlwm txaus
Standard cable, thaiv, lub cev muaj zog windings C11000 Kev lag luam tus qauv, zoo heev tus nqi
Kub dab dej, radiators, thermal tswj (tsis muaj brazing) C11000 Thermal kev ua tau zoo yuav luag zoo tib yam
CNC -cov khoom siv tooj liab (tsis muaj brazing) C11000 Zoo dua machinability, tus nqi qis
Nqus brazing / nqus tsev rauv ua C10200 Yuav tsum siv - C11000 yuav tawg
Hydrogen cua annealing lossis brazing C10200 Yuav tsum siv - C11000 yuav raug mob hydrogen
Torch brazing / nplaim brazing nrog txo cov nplaim taws C10200 Pom zoo heev - C11000 muaj kev pheej hmoo
Hermetic / nqus tsev vacuum{0}} nruj seals thiab cov khoom C10200 Tsis muaj porosity, tsis muaj outgassing
Semiconductor lead thav duab / IC ntim C10200 High purity, tsis muaj kev phom sij
Tight- Radius dabtsi yog khoov (R/t < 1.5) C10200 Zoo dua ductility, qis dua kev pheej hmoo
Siab - zaus / microwave / RF Cheebtsam C10200 Teeb liab kev ncaj ncees, tsis muaj oxide inclusions
Siab -kev co / qaug zog- ib puag ncig tseem ceeb C11000 Cu₂O cov khoom ua kom zoo dua cov qauv nplej, me ntsis zoo zog qaug zog
Kev lag luam dav dav (tsis muaj vuam, tsis muaj brazing, qis temp) C11000 Txuag tus nqi 30% - nws yog qhov kev xaiv

 

Kev Pom Zoo Engineering: Ib Qhov Kev Txiav Txim Siab Yooj Yim

 

Nov yog yuav txiav txim li cas, hauv peb lo lus nug:

Nqe Lus Nug 1: Cov khoom no puas tuaj yeem ua kom sov siab tshaj 370℃hauv hydrogen-muaj lossis txo qhov cua?(Brazing? Lub tshuab nqus tsev vacuum? Hydrogen annealing? Txo cov nplaim vuam?)

YOG → Koj yuav tsum siv C10200. Tsis muaj kev zam. C11000 yuav tsim hydrogen embrittlement.

TSIS MUAJ→ Mus rau nqe lus nug 2.

 

Nqe Lus Nug 2: Cov khoom siv no puas xav tau kev sib khi hermetic, lub tshuab nqus tsev, lossis ultra- muaj kev ntseeg siab?(Semiconductor? Aerospace? Vacuum systems? Medical devices?)

YOG → Xaiv C10200. Lub purity thiab kev ntseeg siab yog tsim nyog tus nqi.

TSIS MUAJ→ Mus rau nqe lus nug 3.

 

Nqe Lus Nug 3: Puas yog tus nqi tseem ceeb ntawm tus tsav tsheb, thiab cov khoom puas tsuas pom ambient lossis qis - qhov kev pabcuam kub?(Standard busbars? Cables? Cov yam ntxwv ntawm qhov chaw? Thaum tshav kub kub dab dej tsis muaj brazing?)

YOG → Xaiv C11000. Nws yog kev lag luam workhorse rau ib qho laj thawj.

TSIS MUAJ→ Nrog koj pab neeg engineering - tab sis C11000 tej zaum txaus.

 

Lus Ceeb Toom: Cov khoom cuav thiab cov khoom siv tsis raug

 

Yog tias tus neeg muag khoom muab "C10200" rau koj ntawm tus nqi C11000 -ua neeg xav tsis thoob.

Qee tus neeg muag khoom tsis txaus ntseeg yuav hloov C11000 rau C10200, paub tias ob cov ntaub ntawv zoo ib yam thiab muaj ze li qhov sib xws. Qhov txawv tsuas yog tshwm sim tom qab koj cov khoom mus los ntawm kev sib tsoo lossis lub tshuab nqus tsev ua haujlwm - thaum lub sijhawm nws lig dhau lawm.

Yuav tiv thaiv koj tus kheej li cas:

  • Yuav Tsum Daim Ntawv Pov Thawj Mill Test (MTC) nrog cov ntsiab lus ntawm cov pa oxygen
  • Qhia meej ASTM B152 ua raws rau ob qib
  • Ua haujlwm nrog cov khoom muaj npe nrov, traceable
  • Xav txog qhov thib peb - tog tshuaj ntsuam xyuas rau kev txiav txim tseem ceeb

Hu rau peb rau koj xaiv

 

Xaus: Tsis txhob cia 0.03% Oxygen rhuav tshem koj cov khoom

 

C10200 thiab C11000 zoo tib yam. Lawv ua hluav taws xob yuav luag zoo ib yam. Lawv ua cua sov yuav luag zoo ib yam. Tab sis qhov ntawd0.03% oxygenhauv C11000 - nyob rau hauv daim ntawv ntawm Cu₂O particles - yog ticking lub sij hawm foob pob.

Yog tias koj qhov txheej txheem suav nrog:

  • Nqus brazing los yog rauv brazing
  • Hydrogen huab cua annealing
  • Torch brazing nrog txo cov nplaim taws
  • Txhua qhov siab -kub ua haujlwm hauv hydrogen- ib puag ncig

 

... ces C11000 yuav tsim hydrogen embrittlement. Nws tsis yog lo lus nug ntawm "yog" - nws yog lo lus nug ntawm "thaum twg" thiab " phem npaum li cas".

Yog tias koj cov khoom yuav tsuas pom qhov kub thiab txias lossis qis -kev ua haujlwm kub, C11000 yog qhov kev xaiv zoo - nws pheej yig dua, cov tshuab zoo dua, thiab ua tau zoo rau nws daim ntawv thov.

Txoj cai engineering yog yooj yim:

  • C11000: Tus nqi -cov neeg ua haujlwm zoo rau kev siv hluav taws xob thiab thermal
  • C10200: Txoj cai pov hwm kev ntseeg tau rau kev sib tsoo, vuam, nqus tsev, thiab siab - txheej txheem kub

Tsis txhob xaiv tooj liab los ntawm tus nqi ib leeg. Xaiv nws los ntawm tus txheej txheem.

Hu rau peb rau cov qauv thiab nqe lus

 

FAQ

 

Q1: Kuv puas tuaj yeem siv C11000 rau brazing yog tias kuv siv cov nplaim nruab nrab lossis oxidizing?
A: Lub nplaim nruab nrab txo qhov kev pheej hmoo tab sis tsis tshem tawm nws. Yog tias muaj hydrogen nyob hauv cov nplaim taws lossis cua sov cua, C11000 tseem raug cuam tshuam. Rau qhov tseem ceeb brazing, C10200 yog qhov kev xaiv zoo dua.

 

Q2: Ntau npaum li cas kim dua yog C10200 piv rau C11000?
A: Feem ntau 20-50% ntau dua, nyob ntawm kev ua lag luam, daim ntawv (strip, bar, raj), thiab kom muaj nuj nqis. Tus nqi them nqi pes tsawg sib txawv - tab sis tus nqi ntawm ib pawg ua tsis tiav yog ib txwm siab dua.

 

Q3: Yuav ua li cas txog C10100 (OFE tooj liab) - nws piv li cas?
A: C10100 yog ultra- siab- purity tooj liab (99.99%, oxygen Tsawg dua lossis sib npaug li 5 ppm) siv rau cov kev xav tau tshaj plaws xws li semiconductor sputtering lub hom phiaj thiab aerospace. Rau feem ntau cov ntawv thov kev lag luam, C10200 (99.95%) muab purity txaus ntawm tus nqi qis.

 

Q4: Puas C10200 thiab C11000 muaj qhov sib txawv RoHS lossis REACH raws li txoj cai?
A: Tsis yog. Ob leeg yog tooj liab ntshiab uas tsis muaj tshuaj txwv. Ob leeg tuaj yeem raug xa tawm mus rau EU lossis lwm lub khw muag khoom.

 

Q5: Kuv puas tuaj yeem vuam C11000 ua tiav?
A: Yog - tab sis tsuas yog ua tib zoo tswj cov txheej txheem. Siv TIG welding nrog ntshiab argon shielding, ua kom lub vuam pas dej me me, thiab tsis txhob muaj cov kab mob hydrogen. Rau qhov tseem ceeb lossis siab - ntim vuam, C10200 yog kev zam txim ntau dua thiab ua rau muaj txiaj ntsig zoo dua.

 

Q6: Qhov txawv ntawm JIS C1020 / C1100 thiab UNS C10200 / C11000 yog dab tsi?
A: Lawv yog cov khoom siv tib yam hauv cov txheej txheem sib txawv. JIS C1020=UNS C10200. JIS C1100=UNS C11000. Nco ntsoov xyuas seb tus qauv twg koj daim duab qhia.

 

Q7: Puas yog C10200 muaj ntau yam conductive tshaj C11000?

A: Tsis yog. Qhov sib txawv ntawm IACS tsuas yog 1-2 %, uas yog qhov tsis txaus ntseeg rau feem ntau ntawm kev tsim hluav taws xob. Lub ntsiab kom zoo dua ntawm C10200 nyob rau hauv hydrogen-embrittlement tsis kam, tsis siab dua conductivity.

 

Q8: Kuv puas tuaj yeem siv C11000 rau lub tshuab nqus tsev chamber?

A: Tsis pom zoo. Yog hais tias cov khoom yuav muaj brazing lossis kub kub hauv lub tshuab nqus tsev vacuum, C11000 yuav ntsib kev pheej hmoo ntawm hydrogen-kab mob, ua rau zais micro-cracks thiab lub tshuab nqus tsev.

 

Q9: Vim li cas C10200 20-50% kim dua C11000?

A: C10200 yuav tsum tau tshwj xeeb lub tshuab nqus tsev smelting thiab nruj deoxidation txheej txheem kom cov pa oxygen nyob rau hauv 10 ppm, uas txhawb nqa cov khoom raw thiab cov nqi tsim khoom.

 

Q10: Cov ntaub ntawv txheem twg siv rau ob qib tooj liab no?

A: Ob leeg ua raws ASTM B152 / B152M specification. Kev ntsuam xyuas hydrogen embrittlement tuaj yeem xa mus rau ASTM B577 xeem txoj kev.

 

 

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